Genus Lands First ALD Customer in Taiwan
02 April 2004 - 12:30AM
PR Newswire (US)
Genus Lands First ALD Customer in Taiwan Major Foundry to Adopt ALD
for Advanced DRAM Production SUNNYVALE, Calif., April 1
/PRNewswire-FirstCall/ -- Genus, Inc. today announced that it
received a purchase order for its StrataGem atomic layer deposition
(ALD) system from one of the world's largest semiconductor
foundries in Taiwan. This marks the first insertion of Genus' ALD
tools into Taiwan. The system will be used for the production of
advanced DRAMs of 110 nm, 90 nm, 70nm and below. Genus' StrataGem
system was selected because it delivers the best in class process
capabilities, smallest footprint and production reliability
necessary for the manufacturing of leading-edge devices. The Genus
StrataGem product offers alarge number of film processes for use in
advanced semiconductor devices including DRAMs, Flash, EDRAMs,
ASICs, logic and thin film heads. The key features of the StrataGem
system is its patented chamber and ALD gas delivery system design.
Today, DRAM capacitors are a main driver of ALD into volume
manufacturing in semiconductors, and this order marks the third
DRAM manufacturer to use Genus' ALD systems in volume production
lines. "ALD has been named the technology of choice for DRAM
capacitors, and Taiwan has been a key target growth area for
Genus," states Bill Elder, chairman and CEO of Genus. "This order
signals the further adoption of ALD use in mass production of
advanced semiconductor devices, and we are pleased to add this key
major Taiwanese customer to the growing list of ALD adopters
worldwide." "Genus has already increased its support and logistics
capabilities in Taiwan as we continue our expansion into the
region," said John Voltz, vice president of sales and marketing for
Genus. "This first purchase of our advanced StrataGem system
validates our customer's confidence in our ability to deliver high
quality, production worthy processes to meet their most advanced
technology requirements." About Genus: Genus, Inc. manufactures
critical deposition processing products for the global
semiconductor industry and the data storage industry. To enable the
production of intricate micro computer chips and electronic storage
devices, Genus offers its StrataGem and LYNX series
production-proven equipment for 200mm and 300mm semiconductor
production, and offers thin film deposition products for chemical
vapor deposition (CVD), atomic layer deposition (ALD), and
pre-clean capabilities. Genus is at the forefront of market and
technology developments in the ALD marketplace, which is gaining
acceptance worldwide as a critical technology for sub 0.13-micron
production of computer chips and electronic storage devices. Genus'
customers include semiconductor and data storage manufacturers
located throughout the United States, Europe and the Pacific Rim
including Korea, Japan and Taiwan. Founded in 1981, the company is
headquartered in Sunnyvale, California. For additional information
visit Genus' web site at http://www.genus.com/. LYNX2(R) and
LYNX3(TM) are trademarks of Genus, Inc. DATASOURCE: Genus, Inc
CONTACT: Trine Pierik of Positio Public Relations, Inc.,
+1-408-453-2400 or , for Genus, Inc.; or Shum Mukherjee of Genus,
Inc., +1-408-747-7140 or Web site: http://www.genus.com/
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