Genus Advances ALD to 45 nm Technology Node and Beyond in Most Advanced University R&D Facility in the World
27 Oktober 2003 - 11:30PM
PR Newswire (US)
Genus Advances ALD to 45 nm Technology Node and Beyond in Most
Advanced University R&D Facility in the World Albany NanoTech
Orders 300 mm Wafer ALD Systems for Advanced Dielectric and EUV
Programs SUNNYVALE, Calif., Oct. 27 /PRNewswire-FirstCall/ --
Genus, Inc. , a leader in advanced thin film deposition equipment
used to manufacture semiconductor and data storage devices, today
announced orders for two atomic layer deposition (ALD) systems from
Albany NanoTech (ANT) of the University at Albany-SUNY (UAlbany)
for its 45 nm research and development (R&D) activities. The
systems will be located at ANT's NanoFab 300 complex, the most
advanced 300 mm wafer R&D facility at any university in the
world. Albany has earmarked a Genus StrataGem300 bridge tool for
its advanced dielectric research program and a StrataGem200 for use
in its extreme ultraviolet (EUV) lithography program. Genus'
Stratagem 200 and 300 mm systems span three generations of
manufacturing, providing unique extendibility and flexibility
benefits for customers worldwide. The tools' multi-film capability
and extendibility from 130 nm down to 45 nm provide Albany with key
benefits for use in an advanced R&D environment. "We are
delighted to be selected by Albany NanoTech for both its advanced
high-k dielectric and lithography EUV programs," said Bill Elder
chairman and CEO of Genus, Inc. "It is a significant milestone in
Genus' ALD program to be accepted at the most notable and
best-funded university program in the United States." "The
selection of the Genus StrataGem300 tool platforms is a critical
enabling step in our strategic plan to establish a center of
excellence in atomic layer deposition to address our high-end
device fabrication and integration needs," stated Alain E.
Kaloyeros, Ph.D., executive director of ANT and founding Dean of
the School. "We are extremely excited by our partnership with
Genus, given its recognition as world's leading supplier of ALD
equipment. The StrataGem300 platforms will significantly strengthen
our research, educational, and workforce training programs, not to
mention the ability to better serve key sectors of our industrial
customer base." About Albany NanoTech Albany NanoTech at UAlbany as
the umbrella organization that oversees and coordinates UAlbany's
comprehensive portfolio of research, education, and outreach
programs in nanosciences, nanoengineering, and nanotechnology. It
serves as a fully-integrated research, development, prototyping,
and technology deployment resource that manages a strategic
portfolio of focus centers that encompass nanoelectronics,
system-on-a-chip technologies, biochips, optoelectronics and
photonics devices, closed-loop sensors for monitoring, detection,
and protection, and ultra-high-speed communication components.
Albany NanoTech is housed in new 425,000 sq. ft. complex, including
the only 200mm/300mm wafer facilities in the academic world. By mid
2004, Albany NanoTech assets will exceed $1.0B in state-of-the-art
equipment and tools, housed within 60,000 sq. ft. of Class 1
capable 300mm wafer cleanrooms. These assets are dedicated to
providing company partners with a unique environment to pioneer,
develop, and test new ideas within a technically aggressive and
financially competitive R&D environment. About Genus Genus,
Inc. manufactures critical deposition processing products for the
global semiconductor industry and the data storage industry. To
enable the production of intricate micro-computer chips and
electronic storage devices, Genus offers its LYNX and StrataGem
series of production-proven equipment for 200 mm and 300 mm
semiconductor production, and offers thin film deposition products
for chemical vapor deposition (CVD), atomic layer deposition (ALD),
and pre-clean capabilities. Genus is at the forefront of market and
technology developments in the ALD marketplace, which is gaining
acceptance worldwide as a critical technology for sub-0.13-micron
production of computer chips and electronic storage devices. Genus'
customers include semiconductor manufacturers located throughout
the United States, Europe and the Pacific Rim including Korea,
Japan and Taiwan. Founded in 1981, the company is headquartered in
Sunnyvale, California. For additional information visit Genus' web
site at http://www.genus.com/. NOTE: LYNX2(R), and LYNX3(TM) are
trademarks of Genus, Inc. Forward-Looking Statements This press
release contains forward-looking statements regarding the company's
future financial and business performance. These forward-looking
statements are subject to a number of risks and uncertainties.
These contingencies include but are not limited to: actual customer
orders received by the company, the extent to which ALD technology
is demanded by the marketplace, the actual number of customer
orders received by the company, availability of components from
suppliers, the timing of final acceptance of products by customers,
the financial climate, accessibility to financing and fulfillment
of closing conditions, general conditions in the thin film
equipment market and in the macro-economy, and the influence of
global political events. Genus assumes no obligation to update this
information. Additional risks and uncertainties are discussed in
the Management's Discussion and Analysis of Results of Operations
contained in Genus' Annual Report on Form 10-K for the fiscal year
ended December 31, 2001 and subsequent quarterly reports on Form
10-Q filed with the Securities and Exchange Commission. DATASOURCE:
Genus, Inc. CONTACT: Trine Pierik of Positio Public Relations,
Inc., +1-650-815-1006, or , for Genus; or Irene Dunlop of Genus,
Inc., +1-408-747-7140, ext. 1140; or Alain E. Kaloyeros, Ph.D., of
Albany NanoTech, +1-518-442 4533, or Web site:
http://www.genus.com/
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